Effect of acetone vapor treatment on photoluminescence of porous nc-Si–SiOx nanostructures

The effect of treatment in saturated acetone vapors on the spectral composition and intensity of photoluminescence (PL) in porous oblique deposited SiOx films is studied. As a result of this treatment followed by high-temperature annealing at the temperature 930 °C, considerable PL intensity grow...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Datum:2009
Hauptverfasser: Indutnyi, I.Z., Michailovska, K.V., Min’ko, V.I., Shepeliavyi, P.E.
Format: Artikel
Sprache:English
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2009
Schriftenreihe:Semiconductor Physics Quantum Electronics & Optoelectronics
Online Zugang:http://dspace.nbuv.gov.ua/handle/123456789/118680
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Effect of acetone vapor treatment on photoluminescence of porous nc-Si–SiOx nanostructures / I.Z. Indutnyi, K.V. Michailovska, V.I. Min’ko, P.E. Shepeliavyi // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2009. — Т. 12, № 2. — С. 105-109. — Бібліогр.: 15 назв. — англ.

Institution

Digital Library of Periodicals of National Academy of Sciences of Ukraine