Accurate numerical modelling the GaAs MESFET current-voltage characteristics
In this paper, we present a computing model of the current-voltage (I-V) characteristics of a gallium arsenide Schottky barrier field effect transistor called GaAs MESFET. This physical model is based on the two-dimensional analysis of the Poisson equation in the active region under the gate. In thi...
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Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2004
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Цитувати: | Accurate numerical modelling the GaAs MESFET current-voltage characteristics / N. Merabtine, S. Khemissi, M. Zaabat, M. Belgat, C. Kenzai // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2004. — Т. 7, № 4. — С. 389-394. — Бібліогр.: 10 назв. — англ. |
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irk-123456789-1192052017-06-06T03:03:12Z Accurate numerical modelling the GaAs MESFET current-voltage characteristics Merabtine, N. Khemissi, S. Zaabat, M. Belgat, M. Kenzai, C. In this paper, we present a computing model of the current-voltage (I-V) characteristics of a gallium arsenide Schottky barrier field effect transistor called GaAs MESFET. This physical model is based on the two-dimensional analysis of the Poisson equation in the active region under the gate. In this frame, we elaborated a simulation software based on analysis of expressions that we have previously set up [1-3], the obtained theoretical results are discussed and compared to the experimental ones. 2004 Article Accurate numerical modelling the GaAs MESFET current-voltage characteristics / N. Merabtine, S. Khemissi, M. Zaabat, M. Belgat, C. Kenzai // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2004. — Т. 7, № 4. — С. 389-394. — Бібліогр.: 10 назв. — англ. 1560-8034 PACS: 85.30.Tv http://dspace.nbuv.gov.ua/handle/123456789/119205 en Semiconductor Physics Quantum Electronics & Optoelectronics Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
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In this paper, we present a computing model of the current-voltage (I-V) characteristics of a gallium arsenide Schottky barrier field effect transistor called GaAs MESFET. This physical model is based on the two-dimensional analysis of the Poisson equation in the active region under the gate. In this frame, we elaborated a simulation software based on analysis of expressions that we have previously set up [1-3], the obtained theoretical results are discussed and compared to the experimental ones. |
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Merabtine, N. Khemissi, S. Zaabat, M. Belgat, M. Kenzai, C. |
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Merabtine, N. Khemissi, S. Zaabat, M. Belgat, M. Kenzai, C. Accurate numerical modelling the GaAs MESFET current-voltage characteristics Semiconductor Physics Quantum Electronics & Optoelectronics |
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Merabtine, N. Khemissi, S. Zaabat, M. Belgat, M. Kenzai, C. |
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Merabtine, N. |
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Accurate numerical modelling the GaAs MESFET current-voltage characteristics |
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Accurate numerical modelling the GaAs MESFET current-voltage characteristics |
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Accurate numerical modelling the GaAs MESFET current-voltage characteristics |
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Accurate numerical modelling the GaAs MESFET current-voltage characteristics |
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Accurate numerical modelling the GaAs MESFET current-voltage characteristics |
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accurate numerical modelling the gaas mesfet current-voltage characteristics |
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Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
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2004 |
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http://dspace.nbuv.gov.ua/handle/123456789/119205 |
citation_txt |
Accurate numerical modelling the GaAs MESFET current-voltage characteristics / N. Merabtine, S. Khemissi, M. Zaabat, M. Belgat, C. Kenzai // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2004. — Т. 7, № 4. — С. 389-394. — Бібліогр.: 10 назв. — англ. |
series |
Semiconductor Physics Quantum Electronics & Optoelectronics |
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AT merabtinen accuratenumericalmodellingthegaasmesfetcurrentvoltagecharacteristics AT khemissis accuratenumericalmodellingthegaasmesfetcurrentvoltagecharacteristics AT zaabatm accuratenumericalmodellingthegaasmesfetcurrentvoltagecharacteristics AT belgatm accuratenumericalmodellingthegaasmesfetcurrentvoltagecharacteristics AT kenzaic accuratenumericalmodellingthegaasmesfetcurrentvoltagecharacteristics |
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2025-07-08T15:25:21Z |
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Semiconductor Physics, Quantum Electronics & Optoelectronics. 2004. V. 7, N 4. P. 389-394.
© 2004, V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine
389
PACS: 85.30.Tv
Accurate numerical modelling the GaAs MESFET
current-voltage characteristics
N. Merabtine1, S. Khemissi2, M. Zaabat3, M. Belgat4, C. Kenzai4
1 Laboratoire Electromagnetisme et Telecommunication, Electronics Department, Faculty of Engineering,
University, Mentouri, Constantine, Algeria
E-mail: na_merabtine@hotmail.com
2 Departement de Seti, Faculté de technologie Université de khenchla, Algeria
E-mail: saadekhemissi@yahoo.fr
3 Physics department, University of Oum-El-Bouaghi, Algeria
E-mail: Zaabat@hotmail.com
4 Laboratoire des Couches Minces et Interfaces, Département de physique Faculté des Sciences, Université
Mentouri de Constantine
E-mail: musbelgat@yahoo.fr
Abstract. In this paper, we present a computing model of the current-voltage (I-V)
characteristics of a gallium arsenide Schottky barrier field effect transistor called GaAs
MESFET. This physical model is based on the two-dimensional analysis of the Poisson
equation in the active region under the gate. In this frame, we elaborated a simulation
software based on analysis of expressions that we have previously set up [1-3], the
obtained theoretical results are discussed and compared to the experimental ones.
Keywords: gallium arsenide, field effect transistor, Poisson equation.
Manuscript received 11.08.04; accepted for publication 16.12.04.
1. Introduction
Essentially, the Gallium Arsenide Field Effect
Transistors (GaAs FET) are high-speed and high-
frequency devices. In this paper, we propose a
simulation of the current-voltage (I-V) characteristics of
a short-gate GaAs MESFETs. Computer-aided analysis
is a useful technology for studying physical phenomena
in semiconductors. Here, we presented two-dimensional
simulation of GaAs MESFET considering the physical
model. Two-dimensional solution of the Poisson
equation has been obtained taking into account structure
study results.
2. Physical model
Fig. 1 shows a normal planar GaAs MESFET simulated
in this paper. Two-dimensional physical model is used to
solve the Poisson equation. This equation known in
semiconductor physics is used in all the models to
explain the different physical phenomena specific to the
GaAs MESFET [4-6].
But the main problem for these models lies in the
coupling of partial and nonlinear differential equations,
which require to be simultaneously solved. The
difficulty of putting down a valid hypothesis for the limit
conditions at the free interface requires the resort to
approximations the negligence of a certain number of
terms that act negatively on the model exactness [4-6].
In this paper, we present an analytical model that
combines the description of physical phenomena and
simplicity of solving the respective mathematical
equation.
3. Determination of the two-dimensional voltage in
the active region
The two-dimensional solution of differential equations
using the Green method gives a distribution of the
electric field under the region of the space charge area
(SCA). The general Poisson equation is given by
ε
ρ−
=
∂
∂
+
∂
∂
=Δ
),(),( 2
2
2
2 yx
y
V
x
VyxV cc
c . (1)
To calculate the voltage under the gate, the SCA is
divided into two main regions shown in Fig. 1.
• The region (1) is directly under the gate, it is
considered as a region controlled by the gate. We
use the uni-dimensional approximation to calculate
the composant of the relation of the voltage Vq(x,y)
specific to this region.
• The region (2) outside the first region is considered
as uncontrolled by the gate. The two-dimensional
voltage of the channel under the gate is given as
follows:
Semiconductor Physics, Quantum Electronics & Optoelectronics. 2004. V. 7, N 4. P. 389-394.
© 2004, V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine
390
Fig. 1. Depletion regions controlled (1) and uncontrolled (2) by
the gate.
Fig. 2. Active area distribution according to the electric field
variation.
Fig. 3. Parasitic resistance of GaAs MESFET.
),(),(),( yxVyxVyxV lqc += , (2)
where
,),(),(),(
)(
0
gbi
xh
y
d
y
d
q VVdyyxeNyydyyxeNyxV ++
ε
+
ε
= ∫∫
(3)
and
( )
( )
( )
( ) ( )yk
Lk
xkA
Lk
xLkAyxV ds
l 1
1
1
1
1
1
1 sin
sinh
sinh
sinh
)(sinh),( ⎥
⎦
⎤
⎢
⎣
⎡
+
−
=
(4)
with
[ ]∫ −=
a
qc
s dyykyVyV
a
A
0
11 )sin(),0(),0(2 (5)
and
[ ]∫ −=
a
qc
d dyykyLVyLV
a
A
0
11 )sin(),(),(2 . (6)
dA1 and sA1 are the Fourier coefficients for the gate
supplementary voltage for the drain and source sides,
respectively [5],
and
a
k
21
π
= .
If considering (3) and (4), the total voltage expression
becomes
∫ +−+
ε
=
)(
0
),(),(),(
xh
bigl
d
c VVyxVydyyxeNyxV . (7)
4. Current-voltage characteristics
To calculate the drain current expression as a function of
the drain voltage for different values of the gate voltage,
we use the following hypothesis:
• we neglect the current in the Y-axis, this
approximation is valid for the short-gate
components;
• we suppose the electrons mobility constant;
• we derived the channel in three regions according to
the electric field value (Fig. 2) [6].
5. Determination of the current general equation
To calculate the drain current general equation, we used
the uni-dimensional approximation to simplify the
mathematical expressions. We also use the following
expressions:
dx
dVNeµEyNeµJ dnxdnx −=−= )(
r
, (8)
the drain current expression is given by
∫ ∫−=−=
)( )(s
a
xh
xxd dyJZdsJI , (9)
using single integrals, the current expression is obtained
by relation
( )⎥⎦
⎤
⎢⎣
⎡ −−−
ε
= 3322
2
3
1)(
2
)(
sdsd
nd
d hhhha
L
ZµeNI (10)
where
( )
2/1
2
⎥
⎦
⎤
⎢
⎣
⎡
−
ε
= gbi
d
s VV
eN
h , (11a)
( )
2/1
2
⎥
⎦
⎤
⎢
⎣
⎡
−+
ε
= gbid
d
d VVV
eN
h (11b)
are the widths of the space charge area (SCA)
respectively source side and drain side.
Semiconductor Physics, Quantum Electronics & Optoelectronics. 2004. V. 7, N 4. P. 389-394.
© 2004, V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine
391
Fig. 4. Comparison of the I-V characteristics measured and calculated by the simulation for MESFETs 1 (a) and 2 (b).
Fig. 5. Effect of the parasitic resistances on the I-V characteristics for MESFETs 1 (a) and 2 (b).
Fig. 6. Effect of the side voltages Vls and Vld on the I-V characteristics for MESFETs 1 (a) and 2 (b).
Semiconductor Physics, Quantum Electronics & Optoelectronics. 2004. V. 7, N 4. P. 389-394.
© 2004, V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine
392
Defining the pinch-off current Ip is given by
L
aZeNI d
p ε
μ
=
2
)( 33
(12)
and the pinch-off voltage Vp is given by
2
2
aeNV d
p ε
= . (13)
The general equation expression IP in the channel
becomes
⎥
⎥
⎦
⎤
⎢
⎢
⎣
⎡
⎟
⎟
⎠
⎞
⎜
⎜
⎝
⎛ −
+⎟
⎟
⎠
⎞
⎜
⎜
⎝
⎛ −+
−=
2/32/3
3
2
3
2
p
gbi
p
gbid
p
d
pd V
VV
V
VVV
V
V
II . (14)
6. Effect of the mobility law
The hypothesis of the constant mobility and the
independency of the electric field in the n-type GaAs can
not convey the physical phenomena. The analytical
expression of the mobility variations with the electric
field used by us is a simplified relation [7, 8] given as
follows:
• for the weak electric field where E < E0
µ = µ0; (15a)
• for the high electric field beyond E0 (E > E0)
2/12
0
0
1
⎥
⎥
⎦
⎤
⎢
⎢
⎣
⎡
⎟⎟
⎠
⎞
⎜⎜
⎝
⎛ −
+
μ
=μ
sE
EE
. (15b)
This mobility law allows to obtain the different
expressions of the drain current in different operation
regimes.
Id (Vd,Vg) characteristics of the GaAs MESFET
corresponding to different operation regimes obey the
equations considered below.
Table 1.
Transistor L, μm A, μm Z, μm
MESFET 1 1 0.153 300
MESFET 2 0.5 0.1435 300
Transistor μ0, m2/V⋅s Nd, 1023m–3
MESFET 1 0.4000 1.17
MESFET 2 0.4000 1.31
Transistor Vs, m/s Vbi,V Vp,V
MESFET 1 3.6 ⋅103 0.85 1.93
MESFET 2 7.3 ⋅103 0.85 1.93
Table 2.
Transistor a1 b1 c1 Vl /Vp
MESFET 1 –0.10 0.10 0.05 0.01
MESFET 2 –0.14 0.10 0.04 0.01
6.1. Linear regime
This regime exists as far as La occupies all the channel, it
corresponds to the weak field area where the mobility is
equal to µ0.
The drain current expression in this regime is
given as
⎥
⎥
⎦
⎤
⎢
⎢
⎣
⎡
⎟
⎟
⎠
⎞
⎜
⎜
⎝
⎛ −
+⎟
⎟
⎠
⎞
⎜
⎜
⎝
⎛ −+
−=
2/32/3
3
2
3
2
3
2
p
gbi
p
gbid
p
d
pld V
VV
V
VVV
V
VII
(16)
where
a
d
pl L
aZµNeI
ε
=
2
3
0
22
.
6.2. Pinch-off regime
As the drain voltage increases, the electric field in the
channel increases beyond E0 .The channel under the gate
can be then represented by two regions.
One region of the length La in which the field is inferior
to E0 and the electron mobility is constant and given by
µ = µ0. Another region of the length Lb (L = La + Lb) in
which the field is superior to the field E0 but inferior to
the field Em, and the electron mobility is given by the
expression (15b).
First region: for E < E0 and 0 < x < La
⎥
⎥
⎦
⎤
⎢
⎢
⎣
⎡
⎟
⎟
⎠
⎞
⎜
⎜
⎝
⎛ −
−⎟
⎟
⎠
⎞
⎜
⎜
⎝
⎛ −+
−=
2/32/3
3
2
3
2
p
gbi
p
gbida
p
da
d
pl
a V
VV
V
VVV
V
V
I
LI
L . (17)
Second region: for E0 < E < Em and La < x < L
⎥
⎥
⎦
⎤
⎢
⎢
⎣
⎡
⎟
⎟
⎠
⎞
⎜
⎜
⎝
⎛ −+
+⎟
⎟
⎠
⎞
⎜
⎜
⎝
⎛ −+
−
−
=
2/32/3
3
2
p
gbida
p
gbid
p
dad
d
ps
b V
VVV
V
VVV
V
VV
I
LI
L
(18)
where
2/12
01
⎥
⎥
⎦
⎤
⎢
⎢
⎣
⎡
⎟⎟
⎠
⎞
⎜⎜
⎝
⎛ −
+
=
s
p
ps
E
EE
I
I .
6.3. Saturation regime
In this case, the channel under the gate is divided into
three regions La, Lb, and Lc where L = La + Lb + Lc.
⎥
⎥
⎦
⎤
⎢
⎢
⎣
⎡
⎟
⎟
⎠
⎞
⎜
⎜
⎝
⎛ −
−⎟
⎟
⎠
⎞
⎜
⎜
⎝
⎛ −+
−=
2/32/3
3
2
3
2
p
gbi
p
gbida
p
da
d
pl
a V
VV
V
VVV
V
V
I
LI
L ,
(19)
Semiconductor Physics, Quantum Electronics & Optoelectronics. 2004. V. 7, N 4. P. 389-394.
© 2004, V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine
393
⎥
⎥
⎦
⎤
⎢
⎢
⎣
⎡
⎟
⎟
⎠
⎞
⎜
⎜
⎝
⎛ −+
+⎟
⎟
⎠
⎞
⎜
⎜
⎝
⎛ −+
−
−
=
2/32/3
3
2
3
2
p
gbida
p
gbidm
p
dadm
d
ps
b V
VVV
V
VVV
V
VV
I
LI
L , (20)
⎥
⎥
⎦
⎤
⎢
⎢
⎣
⎡
⎟
⎟
⎠
⎞
⎜
⎜
⎝
⎛ −+
+⎟
⎟
⎠
⎞
⎜
⎜
⎝
⎛ −+
−
−
=
2/32/3
3
2
3
2
p
gbidm
p
gbid
p
dmd
d
ps
c V
VVV
V
VVV
V
VV
I
LI
L
(21)
where Vda and Vdm are successively maximum and pinch-
off voltages for linear regimes.
7. Effect of the voltage Vl (x, y)
The effect of the voltage Vl(x,y) is taken into
consideration in the following expressions of the drain
and gate voltages:
Vd → Vd + Vld and Vg → Vg + Vls (22)
where
⎟
⎠
⎞
⎜
⎝
⎛ π
==
a
hAhVV ss
slls 2
sin),0( 1 , (23a)
⎟
⎠
⎞
⎜
⎝
⎛ π
==
a
hAhLVV dd
dlld 2
sin),( 1 . (23b)
The coefficient expressions sA1 and dA1 are very
complex [6], they are essentially related to the
polarization voltages Vd and Vg and to the voltages Vbi
and Vp:
⎥
⎥
⎦
⎤
⎢
⎢
⎣
⎡
⎟
⎟
⎠
⎞
⎜
⎜
⎝
⎛
−
−−
+=
2/1
1111 c
V
VVV
baVA
p
lgbi
p
s
, (24a)
⎥
⎥
⎦
⎤
⎢
⎢
⎣
⎡
⎟
⎟
⎠
⎞
⎜
⎜
⎝
⎛
−
−−+
+=
2/1
1111 c
V
VVVV
baVA
p
lgbid
p
d . (24b)
For uniform doping, the coefficients a1, b1, c1, and Vl are
constants.
8. Effect of parasitic elements
The characteristics that we have presented are those
concerning internal or intrinsic dimensions (Id, Vd, Vg).
To obtain the external or extrinsic characteristics (Ids,
Vds, Vgs) of the component, we have to take into
consideration the effect of the parasitic access source
resistance Rs, the drain resistance Rd and also the effect
of the resistance Rp parallel to the channel on the
polarization voltages values (Fig. 3).
To obtain the real expressions of the characteristics
Ids(Vds, Vgs), we have to substitute the intrinsic terms by
the extrinsic terms in all the previous relations.
Therefore
Vd = Vds + Vld – (Rs + Rd)Id, (25a)
Vg = Vgs + Vls – RsId, (25b)
Id = Ids – (Vd/Rp). (25c)
9. Results and discussion
In order to validate the I-V characteristics of the GaAs
MESFET set up in the previous work, a simulation
software based on different formulas and equations is
exposed, as well as the obtained results and their
discussions.
The numerical calculation of the drain current as a
function of the polarization voltage calls the expressions
(16) - (21) previously established.
The study has been carried out on two MESFET 1
and MESFET 2 [6] parameters of which are summarized
in the following Table 1. To calculate the voltages Vld
and Vls (expressions (23a) and (23b)), the values of the
used parameters a1, b1, c1, and Vl/Vp are tabulated in the
Table 2.
In order to check the validity of our model, we have
compared the theoretical results with the experimental
ones for the MESFET 1 and MESFET 2.
In Figs 4a and b, we have respectively represented
the comparison of the measured Ids(Vds,Vgs)
characteristics and the calculated ones by the simulation
for the MESFET 1 and MESFET 2. In the linear regime,
i.e., at a weak drain voltage polarization, we notice a
good agreement between the experimental values and
the simulation ones for both transistors. When the drain
voltage increases and becomes more important, we
notice a certain difference between the experimental
values and the results of the simulation. This difference
progressively increases until the saturation. This
difference is mainly caused by the approximations made
in the mathematical model and the simulation software,
it also stems from the geometric parameters effects and
existence of parasitic quantum phenomenon, which we
have not taken into consideration. In the saturation
regime, when the drain voltage gets important, we notice
that the theoretical results are in a good agreement with
experimental ones. In conclusion, we also remark that
the theoretical and the experimental results have the
similar behavior towards the drain voltage and coincide
well, notably at high values of the Vds voltage. This
shows that the method is well founded.
• Effect of source and drain parasitic resistances
In order to put into evidence the effects of the
source and drain parasitic resistances Rs and Rd on the
I-V characteristics of the GaAs MESFET, in Figs 5a and
b, in the case of the previous two transistors, we present
the variations of the drain current as a function of the
drain voltage with and without the parasitic resistance.
• Effect of the voltage Vl (x, y)
When solving the two-dimensional Poisson
equation, it should be taken into consideration two
voltages existing at the sides of the conducting channel:
Vls source side and Vld drain side. Despite their very
Semiconductor Physics, Quantum Electronics & Optoelectronics. 2004. V. 7, N 4. P. 389-394.
© 2004, V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine
394
weak values, these voltages influence the I-V static
transistor characteristics. In Figs 6a and b, we present
the effect of these side voltages for two studied
structures.
10. Conclusion
In this paper, we have proposed an analytical study of
the I-V characteristics of the GaAs MESFET. The
influence of parasitic elements and sides voltages Vls and
Vld on the drain current Ids expression has been
established, these latest voltages resulted from the
two-dimensional analysis of the Poisson equation by the
Green technique. This study allowed us to carry out a
synthetic approach to this two-dimensional analysis to
realize a valid exactness of the analytical model for
static characteristics of the GaAs MESFET composant.
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