Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire

Studied is the influence of pH, surface-active substances and ultrasonic dispersing on the degree of deagglomeration of aerosol in the polishing suspensions used for CMP of sapphire, the removal rate and the optical quality of the surface at polishing. Ultrasonic dispersing makes it possible to obta...

Full description

Saved in:
Bibliographic Details
Date:2015
Main Author: Vovk, E.A.
Format: Article
Language:English
Published: НТК «Інститут монокристалів» НАН України 2015
Series:Functional Materials
Subjects:
Online Access:http://dspace.nbuv.gov.ua/handle/123456789/119306
Tags: Add Tag
No Tags, Be the first to tag this record!
Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire / E.A.Vovk // Functional Materials. — 2015. — Т. 22, № 1. — С. 110-115. — Бібліогр.: 15 назв. — англ.

Institution

Digital Library of Periodicals of National Academy of Sciences of Ukraine