Plasma assisted deposition of TaB₂ coatings by magnetron sputtering system
In the present paper the results of TaB₂ coating deposition in cluster set-up comprising a low pressure planar magnetron and an inductive plasma source are presented. The system allows to control independently the fluxes of the deposited Ta and B atoms from the sputtered TaB₂ target, and the fluxes...
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| Date: | 2017 |
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| Main Authors: | , , , , , , |
| Format: | Article |
| Language: | English |
| Published: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2017
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| Series: | Вопросы атомной науки и техники |
| Subjects: | |
| Online Access: | http://dspace.nbuv.gov.ua/handle/123456789/122171 |
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| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | Plasma assisted deposition of TaB₂ coatings by magnetron sputtering system / S. Yakovin, A. Zykov, S. Dudin, V. Farenik, A. Goncharov, I. Shelest, V. Kuznetsov // Вопросы атомной науки и техники. — 2017. — № 1. — С. 187-190. — Бібліогр.: 15 назв. — англ. |