Some aspects of deposition of conductive, dielectric and protective coatings on insulators with using arc discharge dc and RF bias

Investigation results for technological process of low temperature plasma deposition of functional coverings for dielectric substrate at low temperatures (50…250 oC) are shown. Combined high frequency and arc plasma sources were used to provide high deposition rate and an opportunity to operate with...

Full description

Saved in:
Bibliographic Details
Date:2017
Main Authors: Taran, V.S., Muratov, R.M., Nezovibat'ko, Y.N., Leonovych, A.V., Sergiiets, M.A.
Format: Article
Language:English
Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2017
Series:Вопросы атомной науки и техники
Subjects:
Online Access:http://dspace.nbuv.gov.ua/handle/123456789/122183
Tags: Add Tag
No Tags, Be the first to tag this record!
Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Some aspects of deposition of conductive, dielectric and protective coatings on insulators with using arc discharge dc and RF bias / V.S. Taran, R.M. Muratov, Y.N. Nezovibat'ko, A.V. Leonovych, M.A. Sergiiets // Вопросы атомной науки и техники. — 2017. — № 1. — С. 265-268. — Бібліогр.: 4 назв. — англ.

Institution

Digital Library of Periodicals of National Academy of Sciences of Ukraine