The formation of n-n⁺ transition in the implanted crystal matrix

The existence of n-n⁺ transition in the elastic area of the implanted crystal matrix GaAs(100) + Ar(Si) is discussed within the framework of the electron-deformation model. It is shown that n-n+ transition becomes sharper with the increase of conductivity zone population (0 <= n <= 0.5). Thus...

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Datum:2004
Hauptverfasser: Peleshchak, R.M., Kuzyk, O.V., Tupichak, V.P., Shuptar, D.D.
Format: Artikel
Sprache:English
Veröffentlicht: НТК «Інститут монокристалів» НАН України 2004
Schriftenreihe:Functional Materials
Online Zugang:http://dspace.nbuv.gov.ua/handle/123456789/134811
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:The formation of n-n⁺ transition in the implanted crystal matrix / R.M. Peleshchak, O.V. Kuzyk, V.P. Tupichak, D.D. Shuptar // Functional Materials. — 2005. — Т. 12, № 2. — С. 201-205. — Бібліогр.: 6 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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Zusammenfassung:The existence of n-n⁺ transition in the elastic area of the implanted crystal matrix GaAs(100) + Ar(Si) is discussed within the framework of the electron-deformation model. It is shown that n-n+ transition becomes sharper with the increase of conductivity zone population (0 <= n <= 0.5). Thus the plane, which corresponds to the border of transition, is shifted to the border of elasticity with the increase of n.