Physical mechanisms of microstructure formation in niobium films under low temperature ionic-atomic deposition
The molecular dynamics method has been used to study the effect of low-energy irradiation with self-ions on the microstructure and residual stresses arising in niobium films in the course of ion-atomic deposition. The ion flow constituted 10 % of the total atomic flow being deposited, the ion ener...
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| Date: | 2006 |
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| Main Authors: | , |
| Format: | Article |
| Language: | English |
| Published: |
НТК «Інститут монокристалів» НАН України
2006
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| Series: | Functional Materials |
| Online Access: | http://dspace.nbuv.gov.ua/handle/123456789/140074 |
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| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | Physical mechanisms of microstructure formation in niobium films under low temperature ionic-atomic deposition / I.G. Marchenko, I.M. Neklyudov // Functional Materials. — 2006. — Т. 13, № 2. — С. 227-233. — Бібліогр.: 33 назв. — англ. |