Digital processing of optical emission spectra of magnetron sputtering plasma system

Digital processing of optical emission spectra of magnetron sputtering plasma system

To solve the actual problem of the analysis of the sputtered particles radiation during coating deposition in a magnetron sputtering system, a digital technique was proposed for processing the emission spectra of the discharge plasma. A graphic OSA application has been created, which allows obtainin...

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Bibliographic Details
Date:2019
Main Authors: Afanasіeva, I.A., Afanasiev, S.N., Azarenkov, N.A., Bobkov, V.V., Gritsyna, V.V., Logachev, Yu.E., Okseniuk, I.I., Skrypnyk, A.A., Shevchenko, D.I., Chornous, V.M.
Format: Article
Language:English
Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2019
Series:Вопросы атомной науки и техники
Subjects:
Physics of radiotechnology and ion-plasma technologies
Online Access:http://dspace.nbuv.gov.ua/handle/123456789/194956
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Digital processing of optical emission spectra of magnetron sputtering plasma system / I.A. Afanasіeva, S.N. Afanasiev, N.A. Azarenkov, V.V. Bobkov, V.V. Gritsyna, Yu.E. Logachev, I.I. Okseniuk, A.A. Skrypnyk, D.I. Shevchenko, V.M. Chornous // Problems of atomic science and technology. — 2019. — № 2. — С. 164. — Бібліогр.: 7 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine

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