Influence of magnetic field configuration and strength on plasma parameters and efficiency of coatings deposition in magnetron sputtering system
Paper presents results of evaluation of the influence of the parameters of the additional anode electromagnetic trap for discharge electrons in a magnetron sputtering system. The efficiency of ionization processes is also investigated. It has been shown experimentally that a slight increase of the a...
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| Datum: | 2022 |
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| Hauptverfasser: | , , , , |
| Format: | Artikel |
| Sprache: | English |
| Veröffentlicht: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2022
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| Schriftenreihe: | Problems of Atomic Science and Technology |
| Schlagworte: | |
| Online Zugang: | http://dspace.nbuv.gov.ua/handle/123456789/195896 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Influence of magnetic field configuration and strength on plasma parameters and efficiency of coatings deposition in magnetron sputtering system / А.G. Chunadra, К.N. Sereda, I.K. Tarasov, V.A. Makhlai, B.M. Kozhukhovskyi // Problems of Atomic Science and Technology. — 2022. — № 6. — С. 103-106. — Бібліогр.: 6 назв. — англ. |