Peculiarities of fluorescence of thin organic films in the field of soft X-ray radiation

The paper presents the results of experimental study on the X-ray fluorescence of new organic films manufactured on the base of polystyrene with activating dopes of P-Terphenyl 1.0%, 1.4-Di-(2-(5-Phenyloxazolyl))- Benzene (POPOP) 0.02% and compounds containing Sn atoms. The fluorescent films, 18 a...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Datum:2004
Hauptverfasser: L’vov, A.N., Senchishin, V.G., Shulika, N.G., Skibin, V.I., Taller, E.G., Voronkina, N.I., Zaleskiy, Yu.G.
Format: Artikel
Sprache:English
Veröffentlicht: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2004
Schriftenreihe:Вопросы атомной науки и техники
Schlagworte:
Online Zugang:http://dspace.nbuv.gov.ua/handle/123456789/79382
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:НазваниеPeculiarities of fluorescence of thin organic films in the field of soft X-ray radiation / A.N. L’vov, V.G. Senchishin, N.G. Shulika, V.I. Skibin, E.G. Taller, N.I. Voronkina, Yu.G. Zaleskiy // Вопросы атомной науки и техники. — 2004. — № 2. — С. 171-173. — Бібліогр.: 3 назв. — англ.

Institution

Digital Library of Periodicals of National Academy of Sciences of Ukraine
Beschreibung
Zusammenfassung:The paper presents the results of experimental study on the X-ray fluorescence of new organic films manufactured on the base of polystyrene with activating dopes of P-Terphenyl 1.0%, 1.4-Di-(2-(5-Phenyloxazolyl))- Benzene (POPOP) 0.02% and compounds containing Sn atoms. The fluorescent films, 18 and 20 µm thick, containing Sn 8% by mass are manufactured and their properties are studied. Measurements were carried out at the special vacuum installation with a low-voltage electron beam. The braking X-ray radiation was excited on the tungsten target in the energy range from 0.25 to 2.5 keV and the beam current of 0.1 mA. It is shown that the given fluorescence material reveals the sensitivity to the X-ray continuum up to the energy of 250 eV without applying a low-noise amplifying device. In this case the specific fluorescence is significantly higher than the respective value for CsI(Tl) single crystal that we have taken as a standard. Addition of Sn ions in the film structure leads to the increase of the film sensitivity at the low-energy edge of the energy range being studied. There is a discussion about possible application of above-mentioned films in the accelerator technique, plasma physics, X-ray microscopy and other fields where the recording of soft X-ray radiation is required.