Development of arc suppression technique for reactive magnetron sputtering
The technique of arc suppression on the target surface of magnetron sputtering system during reactive deposition of Al₂O₃ coatings has been developed. Damping of arcs is achieved by transient polarity change of the magnetron voltage by means of a simple circuit consisting of a capacitor and an...
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| Date: | 2005 |
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| Main Authors: | , , , |
| Format: | Article |
| Language: | English |
| Published: |
Науковий фізико-технологічний центр МОН та НАН України
2005
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| Series: | Физическая инженерия поверхности |
| Online Access: | http://dspace.nbuv.gov.ua/handle/123456789/98765 |
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| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | Development of arc suppression technique for reactive magnetron sputtering / S.V. Dudin, V.I. Farenik, A.N.Dahov, J. Walkowicz // Физическая инженерия поверхности. — 2005. — Т. 3, № 3-4. — С. 211–215. — Бібліогр.: 6 назв. — англ. |