Research on processes of texture formation in "NiW substrate and TiN coating" system and creation of the new type textured paramagnetic substrates for HTS based on YBa₂Cu₃O₇

The paper investigates the processes of texture formation in thin-film two-component system based on paramagnetic Ni - 9.5 at. % W substrate with TiN coating. It is studied the influence of deposition time and pressure of nitrogen on the cubic texture formation in both components of "NiW/TiN&qu...

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Date:2017
Main Authors: Sunhurov, M.S., Leonov, S.A., Sukhareva, T.V., Derevyanko, V.V., Finkel, V.A., Shakhov, Yu.N.
Format: Article
Language:English
Published: НТК «Інститут монокристалів» НАН України 2017
Series:Functional Materials
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Research on processes of texture formation in "NiW substrate and TiN coating" system and creation of the new type textured paramagnetic substrates for HTS based on YBa₂Cu₃O₇ / M.S. Sunhurov, S.A. Leonov, T.V. Sukhareva, V.V. Derevyanko, V.A. Finkel, Yu.N. Shakhov // Functional Materials. — 2017. — Т. 24, № 1. — С. 63-67. — Бібліогр.: 10 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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Summary:The paper investigates the processes of texture formation in thin-film two-component system based on paramagnetic Ni - 9.5 at. % W substrate with TiN coating. It is studied the influence of deposition time and pressure of nitrogen on the cubic texture formation in both components of "NiW/TiN" system by using XRD methods. It is observed the effect of re-orientation of crystal planes in the Ni - 9.5 at. % W tape exposed the influence of the coating that leads to a substantial enhancing the cubic texture of the paramagnetic substrate. It is also established that optimization of the conditions of thin TiN layer deposition makes it possible to obtain quasi single crystalline TiN coatings with cubic texture. These textured Ni - 9.5 at. % W/TiN substrates admit the epitaxial growth of high quality HTS films with the high current carrying capacity.