Surface morphology and structure of nanocrystalline diamond films deposited in CH₄/H₂/Ar glow discharge plasma
Diamond films of up to 12 μm thickness have been deposited onto single crystal silicon substrates by CVD method in CH₄/H₂/Ar glow discharge plasma stabilized by magnetic field. X-ray diffraction analysis and atomic force microscopy have shown the films consist of about 1 μm in diameter conglomerates...
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| Datum: | 2009 |
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| Hauptverfasser: | , , , , , |
| Format: | Artikel |
| Sprache: | English |
| Veröffentlicht: |
НТК «Інститут монокристалів» НАН України
2009
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| Schriftenreihe: | Functional Materials |
| Schlagworte: | |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Surface morphology and structure of nanocrystalline diamond films deposited in CH₄/H₂/Ar glow discharge plasma // I.I. Vyrovets, V.I. Gritsyna, S.F. Dudnik, O.A. Opalev, E.N. Reshetnyak, V.E. Strel'nitskiy // Functional Materials. — 2009. — Т. 16, № 2. — С. 155-160. — Бібліогр.: 13 назв. — англ. |