Design and research of combined magnetron-ion-beam sputtering system
The design and characteristics of a new combined magnetron-ion-beam sputtering system are presented. The system allows coating deposition both by means of magnetron discharge, and by sputtering of complex composite targets by high-energy ion beam. Computer simulation and optimization of magnetic fie...
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| Date: | 2018 |
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| Main Authors: | , , , , , |
| Format: | Article |
| Language: | English |
| Published: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2018
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| Series: | Вопросы атомной науки и техники |
| Subjects: | |
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| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | Design and research of combined magnetron-ion-beam sputtering system / S. Dudin, O. Tkachenko, A. Shchybria, S. Yakovin, A. Zykov, N. Yefymenko // Вопросы атомной науки и техники. — 2018. — № 6. — С. 263-266. — Бібліогр.: 9 назв. — англ. |