Model of smoothing roughness on GaAs wafer surface by using nonabrasive chemical-and-mechanical polishing

Model of smoothing roughness on GaAs wafer surface by using nonabrasive chemical-and-mechanical polishing

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Bibliographic Details
Date:2017
Main Authors: A. V. Fomin, G. A. Pashchenko, Yu. Kravetskyi, I. G. Lutsyshyn
Format: Article
Language:English
Published: 2017
Series:Semiconductor Physics, Quantum Electronics and Optoelectronics
Online Access:http://jnas.nbuv.gov.ua/article/UJRN-0000714494
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Journal Title:Library portal of National Academy of Sciences of Ukraine | LibNAS

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Library portal of National Academy of Sciences of Ukraine | LibNAS
id open-sciencenbuvgovua-36194
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spelling open-sciencenbuvgovua-361942024-02-29T11:30:56Z Model of smoothing roughness on GaAs wafer surface by using nonabrasive chemical-and-mechanical polishing A. V. Fomin G. A. Pashchenko Yu. Kravetskyi I. G. Lutsyshyn 1560-8034 2017 en Semiconductor Physics, Quantum Electronics and Optoelectronics http://jnas.nbuv.gov.ua/article/UJRN-0000714494 Article
institution Library portal of National Academy of Sciences of Ukraine | LibNAS
collection Open-Science
language English
series Semiconductor Physics, Quantum Electronics and Optoelectronics
spellingShingle Semiconductor Physics, Quantum Electronics and Optoelectronics
A. V. Fomin
G. A. Pashchenko
Yu. Kravetskyi
I. G. Lutsyshyn
Model of smoothing roughness on GaAs wafer surface by using nonabrasive chemical-and-mechanical polishing
format Article
author A. V. Fomin
G. A. Pashchenko
Yu. Kravetskyi
I. G. Lutsyshyn
author_facet A. V. Fomin
G. A. Pashchenko
Yu. Kravetskyi
I. G. Lutsyshyn
author_sort A. V. Fomin
title Model of smoothing roughness on GaAs wafer surface by using nonabrasive chemical-and-mechanical polishing
title_short Model of smoothing roughness on GaAs wafer surface by using nonabrasive chemical-and-mechanical polishing
title_full Model of smoothing roughness on GaAs wafer surface by using nonabrasive chemical-and-mechanical polishing
title_fullStr Model of smoothing roughness on GaAs wafer surface by using nonabrasive chemical-and-mechanical polishing
title_full_unstemmed Model of smoothing roughness on GaAs wafer surface by using nonabrasive chemical-and-mechanical polishing
title_sort model of smoothing roughness on gaas wafer surface by using nonabrasive chemical-and-mechanical polishing
publishDate 2017
url http://jnas.nbuv.gov.ua/article/UJRN-0000714494
work_keys_str_mv AT avfomin modelofsmoothingroughnessongaaswafersurfacebyusingnonabrasivechemicalandmechanicalpolishing
AT gapashchenko modelofsmoothingroughnessongaaswafersurfacebyusingnonabrasivechemicalandmechanicalpolishing
AT yukravetskyi modelofsmoothingroughnessongaaswafersurfacebyusingnonabrasivechemicalandmechanicalpolishing
AT iglutsyshyn modelofsmoothingroughnessongaaswafersurfacebyusingnonabrasivechemicalandmechanicalpolishing
first_indexed 2025-07-17T18:11:10Z
last_indexed 2025-07-17T18:11:10Z
_version_ 1837919019455217664

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