Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering

Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering

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Bibliographic Details
Date:2016
Main Authors: V. I. Popovych, A. I. Yevtushenko, O. S. Lytvyn, V. R. Romaniuk, V. M. Tkach, V. A. Baturyn, Ye. Karpenko, M. V. Dranchuk, L. O. Klochkov, M. H. Dusheiko, V. A. Karpyna, H. V. Lashkarov
Format: Article
Language:English
Published: 2016
Series:Ukrainian Journal of Physics
Online Access:http://jnas.nbuv.gov.ua/article/UJRN-0000732262
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Journal Title:Library portal of National Academy of Sciences of Ukraine | LibNAS

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Library portal of National Academy of Sciences of Ukraine | LibNAS

Internet

http://jnas.nbuv.gov.ua/article/UJRN-0000732262

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