Comparison of physicochemical properties of nitride films produced by various reactive sputtering methods

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Bibliographic Details
Date:2013
Main Authors: N. A. Vasilenko, A. O. Vasilenko
Format: Article
Language:English
Published: 2013
Series:Journal of mechanical engineering
Online Access:http://jnas.nbuv.gov.ua/article/UJRN-0000450102
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Library portal of National Academy of Sciences of Ukraine | LibNAS
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spelling open-sciencenbuvgovua-849952024-04-16T18:42:09Z Comparison of physicochemical properties of nitride films produced by various reactive sputtering methods N. A. Vasilenko A. O. Vasilenko 0131-2928 2013 en Journal of mechanical engineering http://jnas.nbuv.gov.ua/article/UJRN-0000450102 Article
institution Library portal of National Academy of Sciences of Ukraine | LibNAS
collection Open-Science
language English
series Journal of mechanical engineering
spellingShingle Journal of mechanical engineering
N. A. Vasilenko
A. O. Vasilenko
Comparison of physicochemical properties of nitride films produced by various reactive sputtering methods
format Article
author N. A. Vasilenko
A. O. Vasilenko
author_facet N. A. Vasilenko
A. O. Vasilenko
author_sort N. A. Vasilenko
title Comparison of physicochemical properties of nitride films produced by various reactive sputtering methods
title_short Comparison of physicochemical properties of nitride films produced by various reactive sputtering methods
title_full Comparison of physicochemical properties of nitride films produced by various reactive sputtering methods
title_fullStr Comparison of physicochemical properties of nitride films produced by various reactive sputtering methods
title_full_unstemmed Comparison of physicochemical properties of nitride films produced by various reactive sputtering methods
title_sort comparison of physicochemical properties of nitride films produced by various reactive sputtering methods
publishDate 2013
url http://jnas.nbuv.gov.ua/article/UJRN-0000450102
work_keys_str_mv AT navasilenko comparisonofphysicochemicalpropertiesofnitridefilmsproducedbyvariousreactivesputteringmethods
AT aovasilenko comparisonofphysicochemicalpropertiesofnitridefilmsproducedbyvariousreactivesputteringmethods
first_indexed 2024-04-17T06:04:26Z
last_indexed 2024-04-17T06:04:26Z
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