Механiзми еволюцiї поверхнi при ростi нелегованих нанокремнiєвих плiвок

The thickness dependence of the surface roughness and the grain size of nanosilicon films, produced by low-pressure chemical vapour deposition, has been found, by using atomic force microscopy. A correlation between the surface roughness, grain size, and transformation of a film structure from the e...

Full description

Saved in:
Bibliographic Details
Date:2019
Main Authors: Nakhodkin, N. G., Rodionova, T. V., Sutyagina, A. S.
Format: Article
Language:English
Ukrainian
Published: Publishing house "Academperiodika" 2019
Subjects:
Online Access:https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2019277
Tags: Add Tag
No Tags, Be the first to tag this record!
Journal Title:Ukrainian Journal of Physics

Institution

Ukrainian Journal of Physics
Description
Summary:The thickness dependence of the surface roughness and the grain size of nanosilicon films, produced by low-pressure chemical vapour deposition, has been found, by using atomic force microscopy. A correlation between the surface roughness, grain size, and transformation of a film structure from the equiaxial structure into a fibrous one is established. Possible mechanisms of surface evolution are analyzed.