Вплив парціального тиску азоту на реактивне магнетронне розпилення Ti13Cu87 мішені: моделювання хімічного складу
A sintered Ti13Cu87 composite target was reactively sputtered in Ar–N2 gas mixtures, and sputtered species were deposited on Si (111) substrates. We study the pressure-dependent target mode variation of the Ti13Cu87–N2 system, by measuring the N2 partial pressure, deposition rate, target voltage, an...
Saved in:
Date: | 2012 |
---|---|
Main Authors: | , |
Format: | Article |
Language: | English |
Published: |
Publishing house "Academperiodika"
2012
|
Subjects: | |
Online Access: | https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2021247 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Journal Title: | Ukrainian Journal of Physics |