Структури і профілі тонких KY3F10:Ho3+ плівок, нанесених імпульсним лазерним впливом: Pulsed laser deposition of thin films
Thin films of phosphor have been successfully prepared by pulsed laser deposition using Nd-YAG laser (266 nm, pulse duration of 10 ns, repetition rate of 2Hz) on a (100) silicon substrate in vacuum environment and for different target to substrate distances. The X-ray diffraction...
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| Datum: | 2018 |
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| Hauptverfasser: | , |
| Format: | Artikel |
| Sprache: | English |
| Veröffentlicht: |
Publishing house "Academperiodika"
2018
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| Schlagworte: | |
| Online Zugang: | https://ujp.bitp.kiev.ua/index.php/ujp/article/view/71 |
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| Назва журналу: | Ukrainian Journal of Physics |