Ion energy and angular distributions in RF capacitively coupled plasma sources

The possibilities to control ion energy distribution functions (IEDFs) and ion angle distribution functions (IADFs) on electrodes in single- and dualfrequency capacitively coupled plasma (CCP) sources are investigated by means of particle-in-cell/Monte Carlo (PIC/MCC) simulations. It is shown that...

Full description

Saved in:
Bibliographic Details
Date:2006
Main Authors: Manuilenko, O.V., Minaeva, K.M.
Format: Article
Language:English
Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2006
Series:Вопросы атомной науки и техники
Subjects:
Tags: Add Tag
No Tags, Be the first to tag this record!
Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Ion energy and angular distributions in RF capacitively coupled plasma sources / O.V. Manuilenko, K.M. Minaeva // Вопросы атомной науки и техники. — 2006. — № 5. — С. 116-121. — Бібліогр.: 16 назв. — англ.

Institution

Digital Library of Periodicals of National Academy of Sciences of Ukraine